ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,781, issued on Aug. 11, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo). "Salt, acid generator, resist composition and method for produc... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,782, issued on Aug. 11, was assigned to FUJIFILM Corp. (Tokyo). "Actinic ray-sensitive or radiation-sensitive resin composition, actinic ra... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,783, issued on Aug. 11, was assigned to DUK SAN NEOLUX Co. LTD. (Cheonan-si, South Korea). "Method for preparing pixel define layer" was in... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,784, issued on Aug. 11, was assigned to Hyun Min Kim (Cheonan-si, South Korea). "Substrate processing apparatus and substrate processing me... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,785, issued on Aug. 11, was assigned to Tokyo Electron Ltd. (Tokyo). "Point of use solvent mixing for film removal" was invented by Lior Hu... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,786, issued on Aug. 11, was assigned to XEIKON PREPRESS N.V. (Ypres, Belgium). "Apparatus and method for treating and transporting a relief... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,787, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.). "Single-cell scatterometry overlay with sensitivity calibration" was ... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,788, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.). "Parallax method for a single-cell diffraction based measurement of m... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,789, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.). "Flexible measurement models for model based measurements of semicond... Read More
ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,790, issued on Aug. 11, was assigned to KLA Corp. (Milpitas, Calif.). "System and method for determining overlay measurement of a scanning ... Read More